GM-TOF

Real-Time Gas Analysis System
GM-TOF_Cutout1
GM-TOF_Cutout2
  • · Real-time monitoring of ion signal is possible based on rapid scan of up to 10,000 spectra/sec
  • · Gas process Optimization
  • · Real-time measurement of even low concentrations of 100 ppb gas is possible
  • · Res. ~800 M/ΔM. It can clearly analyze the isotope ions
  • · Implement high mass accuracy of less than 3 mDa on average over a wide range of measurements
  • · Fast process monitoring for semiconductor processes
GM-TOF’s (Benefits)

Real-time monitoring

Wide measurement range with high accuracy

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Fast scanning speed of up to 10,000 spectra per second

Capable of detection in low-concentration gas environments

Application

GM_1

Etching Gas Analysis

Capable of monitoring and analyzing various fluorine-containing etching gases (C₄F₆, Cyclo-C₄F₈, CH₂F₂, etc.)
GM_2

Inorganic and Metal Gas Analysis

Capable of analyzing inorganic and metal-based gases such as silicon and tungsten
Equipment (Specification)
Ionization Methods Electron Impact Ionization
Vacuum System High Vacuum System
L×W×H 400x650x1050 mm
Weight 80 kg