- · Real-time monitoring of ion signal is possible based on rapid scan of up to 10,000 spectra/sec
- · Gas process Optimization
- · Real-time measurement of even low concentrations of 100 ppb gas is possible
- · Res. ~800 M/ΔM. It can clearly analyze the isotope ions
- · Implement high mass accuracy of less than 3 mDa on average over a wide range of measurements
- · Fast process monitoring for semiconductor processes
GM-TOF
Real-Time Gas Analysis System


GM-TOF’s (Benefits)

Real-time monitoring

Wide measurement range with high accuracy

Fast scanning speed of up to 10,000 spectra per second

Capable of detection in low-concentration gas environments
Application

Etching Gas Analysis
Capable of monitoring and analyzing various fluorine-containing etching gases (C₄F₆, Cyclo-C₄F₈, CH₂F₂, etc.)

Inorganic and Metal Gas Analysis
Capable of analyzing inorganic and metal-based gases such as silicon and tungsten
Equipment (Specification)
Ionization Methods | Electron Impact Ionization |
---|---|
Vacuum System | High Vacuum System |
L×W×H | 400x650x1050 mm |
Weight | 80 kg |